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Access Facilities at LP3

The LP3 infrastructure is mainly devoted to study laser interaction at medium intensity (< 10^15 W/cm2) with a highlight on UV laser interaction from fs, ps to ns pulse duration with the possibility to study laser interaction at high repetition rate and high average power. A large panel of laser sources are available from pulse durations of 40 ns to 50 fs including ps sources, from UV (193 nm) to IR, and connected with microscopes, clean room (class 1 and 100), beam delivery systems, etc. An unique excimer source in the world delivers an average power higher than 1000W at 308 nm. Laser processing like LIFT (Laser Induced Forward Transfer), LIBS (Laser Induced Breakdown Spectroscopy), PLD (Pulsed Laser Deposition), laser surface nanostructuring, Laser damage, nanocluster produced by laser ablation, laser doping, laser interaction with nanoparticles, laser annealing, thin film deposition, and laser producing new material are under investigation. The main field of applications are micro and nanoelectronics, energy (solar cells, nuclear), manufacturing, transport, health, environment, nanotechnologies and instrumentations.


Activies areas of research at LP3 include :

  • Fundamentals of Laser-Material Interactions : Experiments, Modelling and Simulation, Laser Surface Interactions, Ultrafast Phenomena and Dynamics,
  • Laser Materials Processing : Patterning, Cleaning, Annealing, Deposition, Modification, 3 D Structuring, Ultrafast Laser Surface Processing and Structuring, LIFT
  • Laser Analysis : LIBS, Diagnostics, Laser-based Probes
  • Lasers in Nanoscience – Nanotechnology and Biophotonics : Cluster and Nanoparticle Formation, Nanoscale Processing and Structuring, Laser interaction with biological tissues.

LP3 facilities offer a wide panel of pulsed laser sources associated with a large variety of in situ diagnostics and surface characterisation instrumentations.

Main laser sources :

  • 6 excimer lasers : UV635 308nm, 1 kW, 2J, 500Hz, 80 ns ; EMG 203 MSC Lambda Physik, 400mJ, 100W, 250Hz, 248 nm ; 2 LPX 210i Lambda Physik, 40W, 100Hz, 193 nm and 248 nm ; and 2 compact sources (OPTEX and EXCISTAR) working respectively at 193 nm and 248 nm (5ns, 200 Hz, 2W).
  • 2 Nanosecond laser Nd:YAG (1ω, 2 ω) : 8ns, 10Hz, 0.5 to 1 J.
  • 1 Picosecond laser Nd:YAG (1ω, 2 ω, 3 ω, 4 ω) :< 50ps, > 100 mJ, 10Hz,
  • 5 Femtosecond Lasers(Ti : Sa and Ytterbium)  : 50 to 400 fs Oscillators : 10 nJ, 80 and 50 MHz , Amplifiers : 0.1 mJ – 10 KHz, 1 mJ - 1000 Hz, 25 mJ -10 Hz.
  • Femtosecond OPA : (0.3 to 10 µm, 100 fs).

Main instrumentations :

  • optical spectroscopy : transmission, absorption, LIF
  • fast imaging : ICCD camera (UV – visible, ns resolution)
  • insitu optical microscopy : Olympus BXFM and SZX12, Zeiss Axiotech 100 HD, Nikon.
  • Vacuum chambers : up to 10-7 mbar
  • clean room : class 1 and 100
  • Surface Characterisation : MEB, AFM.

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